- Company: Kaufman & Robinson Inc.
- Type: Other
- Dimensions: 3.7" D x 3" H
- Discharge Voltage/Current: 50-300 V/5 A
- Operating Gases: Ar, Xe, Kr, O2, N2, Organic Precursors
The compact and efficient eH400 is ideally suited to provide cost-effective, high-current ion beams for small to medium sized vacuum systems. It is commonly used for ion assist, precleaning, and low energy etching.
Features & Benefits- Removable Anode Assembly
- Ease of maintenance
- Minimizes down-time during maintenance
- Plug-and-play spare anode
- Broad-Beam High Discharge Current
- Uniform etch rates
- High etch rate
- High ion assist deposition (IAD) rates
- Versatile
- Load lock/Ultra High Vacuum (UHV) compatible
- Small footprint
- Cost Efficient
- Lower cost per mA/cm2 than gridded sources
- Low maintenance cost
- Efficient plasma conversion and stable power control
Applications- IAD
- Load Lock Preclean
- In-situ Preclean
- Low-energy etching
- Polymer Substrates
1330 Blue Spruce Dr.
Fort Collins, CO 80524-2030
United States
Phone: +1 970-495-0187
Toll-free: +1 866-846-4514