The NC IV PARMS can work under Dual AC, pulsed DC, DC and RF excitations. It is excellent at producing a variety of oxides such as Tantalum, Niobium, Titanium, Germanium and Silicon. The inclusion of the ebeam instrumentation allows the system to evaporate almost any material should one be incompatible via magnetron sputtering.
1401 Duff Dr.
Suite 600
Fort Collins, CO 80524
United States
Phone: +1 970-305-8508
Toll-free: +1 800-959-5517