The NC IV IBSD deposits on up to 250mm diameter substrates. It can be configured for load lock or batch open to air substrate loading. With its sputter up geometry, it brings premium, low particle PVD deposition capability to thin film fabrication. It sputters at low pressure metals & dielectrics without powered cathodes. It produces coatings with high density, low particles, smooth and stable properties.
1401 Duff Dr.
Suite 600
Fort Collins, CO 80524
United States
Phone: +1 970-305-8508
Toll-free: +1 800-959-5517