Research development, semiconductor wafer foundry; analog, bipolar, CMOS, thin film, resistors, sensors, inertial pressure, temperature, photodiodes, phototransistors, detectors, integrated circuits, epitaxy, diffusion, oxidation, LPCVD, PECVD, sputtering, e-beam, platinum, gold, lithography, plasma, dry etching, sputter deposition.
Established: 1986
Employees: 9
Facility area (sq ft): 6000
Ownership type: Privately Owned