Electrostatic chucks, high-voltage power supplies, remotely powered robotic systems. High density plasma-enhanced CVD (HDPECVD) single-wafer equipment for low-defect, and low-stress dielectric films plus high rate etching. Optical lightweighting, machining, optical generation in ceramics, ULE, Zerodur. Thermal and vacuum system design.
Established: 1985
Facility area (sq ft): 40,000
Ownership type: Privately Owned