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Patterned Filters

DSI’s photolithography capability produces patterned thin-film coatings (including bandpass filters, absorption coatings, and metals) on substrates up to 6 inches. DSI’s processes enable high placement accuracy, the ability to accurately maintain coating spectral properties at the smallest geometries, and two-sided patterning capabilities (for flat windows and filters). DSI utilizes both wet and dry film resist processes to support the development and production of challenging patterned coating geometries for our customers. Our positive and negative resist photolithography processes enable two-sided patterning of these coatings with feature sizes as small as 20 µm. With our well-equipped metrology lab, we can measure spectral performance over operating temperatures as low as 15 K and as high as 353 K, perform a wide range of Mil-Spec environmental tests, and precisely measure surface figure both before and after coating. Common substrates are Fused Silica, BK7 and Glasses, Gallium Arsenide, Germanium, Indium Phosphide, Sapphire, Silicon. Applications include multispectral sensing/imaging, intelligence, surveillance, reconnaissance (ISR), remote sensing, aerospace intelligence, and space imaging. DSI’s optical thin-films and patterns are custom-designed for specific applications. Our engineers work closely with customers to design the optimal combination of performance, delivery, and cost. Contact us today to discuss your next project.More products