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Bruker Nano Surfaces
Div. of Bruker Corp.
Map5255 E Williams Circle, Suite 2080
Tucson, AZ 85711
United States
Phone: +1 520-741-1044
Fax: +1 520-294-1799
Toll-free: +1 800-873-9750
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White Papers, Application Notes, & Data Sheets
Thickness Measurements of Opaque and Transparent Films or Coatings with WLIAccurate control over film thickness and uniformity is essential for throughput and performance in the automotive, aerospace, semiconductor, medical, and research industries. The modern standard for...
Characterizing Surface Quality: Why Average Roughness (Ra) is not EnoughQuantification of surface finish is both complex and necessary. Despite surface topography being three-dimensional, the most established surface measurement parameter is average roughness (Ra), a...
Spatiospectral Nanoimaging of Surface Phonon PlasmonsSurface plasmon polaritons (SPPs) in 2D materials enhance light-matter interaction and enable development of super lenses, subwavelength metamaterials, and other photonic devices. In-situ...
Full-Field Hotspot Detection and High-Resolution Topographic Characterization of Post-CMP Wafers with 3D Optical ProfilingTraditional methods of post-CMP process evaluation have analytical limitations that, in light of tightening process control limits, do not meet the growing need for more accurate wafer surface...
Characterization of Advanced Semiconductor Materials and Processes with Nanoscale IR SpectroscopyThis application note demonstrates the successful application of Tapping AFM-IR to distinguish the chemical footprints of several nanoscale lithographic patterns consisting of complex molecular...
Characterization of Advanced Semiconductor Materials and Processes with Nanoscale IR SpectroscopyThis application note demonstrates the successful application of Tapping AFM-IR to distinguish the chemical footprints of several nanoscale lithographic patterns consisting of complex molecular...
USI Universal Adaptive Profiling Measurement Mode for Superior Surface Texture CharacterizationBruker has recently released the Universal Scanning Interferometry (USI) measurement mode to enable universal measurement results on wide-ranging surfaces for ContourX white light interferometry...
Advantages of Measuring Surface Roughness with White Light InterferometryThis application note discusses the use of mean roughness measurements with white light interferometry (WLI) optical profilers. Spatial filters are explained, as well as some of the normative...
Improving Additive Manufacturing with Accurate Surface MetrologyStandard manufacturing formative techniques (e.g., molding, injecting, casting, stamping, forging) and subtractive processes (e.g., CNC milling and turning, drilling, cutting) are being challenged by...
High-Resolution Chemical Imaging with Tapping AFM-IRWhere the spatial resolution of conventional bulk IR spectroscopy is limited by diffraction to ~3-10 µm, atomic force microscopy (AFM) provides a nanoscale topographic map of a sample surface....

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