Vacuum Deposition and Etch Equipment

Name: Vacuum Deposition and Etch Equipment
Rating: 5 (1 reviews)

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Type: Coating Systems
Applications: Astronomy, Biomedical/Medical, Communications, Industrial, Military, Scientific Research
Wafer Diameters: 76 - 200 mm
Chamber: Self cleaning; compact

High rate, low pressure enhanced discharge with very low particle generation for defect-free and densified films.

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