Yale Selects Vistec Litho System

Vistec Lithography Inc. announced that Yale University of New Haven, Conn., selected its EBPG5000plus electron-beam lithography system for its future nanotechnology research programs.

The system, as part of the Yale Institute for Nanoscience and Quantum Engineering, will enhance the effectiveness of research and education at the university in emerging nanotechnology and will encourage multidisciplinary research involving the faculty, students and associated worldwide research partners.

The lithography system features enhancements in resolution, noise reduction and beam stability, generating structures to less than 8 nm on substrates up to 150 mm in diameter, including fragments and special substrates. Its electron-optical column is rated for acceleration voltages of 20, 50 and 100 kV, says the company.

Additionally, it is equipped for true 100 kV/1 mm performance under regular electron-optical conditions with a wide current capability for high throughput applications.

“The acquisition of the Vistec EBPG5000plus will enable the Yale research community to explore the expanding field of nanotechnology with a state-of-the-art electron-beam lithography patterning system,” said Dr. Michael Rooks, facilities director of the Yale Institute for Nanoscience and Quantum Engineering. “We will utilize the system for a wide variety of applications including applied physics, electrical engineering and biotechnology.”

For more information, visit: www.vistec-semi.com