Carl Zeiss to Supply Tools for Photomask Metrology
A team of manufacturers led by Sematech of Austin, Texas, has selected Carl Zeiss SMT AG of Oberkochen, Germany, to supply advanced tools for photomask pattern placement metrology. The technology is considered critical in the implementation of 193-nm immersion lithography and of extreme-UV lithography for the 45-nm mode and beyond.LATEST NEWS
- Liquid Crystal Lens Filters out Light that Causes Seizures Nov 26, 2024
- Solar Lasers Could Power Future Space Missions Nov 26, 2024
- Optimax Names Joseph Spilman CEO Nov 25, 2024
- Shape of a Single Photon Revealed with New Theory Nov 25, 2024
- Optogenetics Technique Could Replace Surgical Treatments for Seizures Nov 25, 2024
- HOLOEYE Partners with Fraunhofer IPMS on Microdisplay Nov 22, 2024
- PI Expands German Production Site: Week in Brief: 11/22/24 Nov 22, 2024
- Lightsynq Emerges from Stealth with $18M Series A Nov 21, 2024