Under the agreement, Nissho will establish a multimillion dollar demonstration facility in the Tokyo area in early 2003. The Nissho facility will initially include a Primaxx LSMCD system and support and analysis equipment. A vortex-CVD system and a CET system will be added in the first half of next year. The lab will be configured to simulate optimized throughput in a high-volume production environment.
Primaxx Inc. makes thin-film deposition and dry etch systems for the semiconductor industry.
For more information, visit: www.primaxxinc.com