JENA, Germany, Sept. 18, 2012 — The ORION NanoFab is being introduced by Carl Zeiss Microscopy GmbH. The multi-ion-beam tool based on gas field ion source technology is an enhancement to the existing helium ion microscope and also uses neon ions. The system provides sub-10-nm nanofabrication and subnanometer-spatial-resolution imaging for industry, government and academic research laboratories. An optional gallium focused ion beam column can be integrated.
The high depth of field enables study of carbon-based materials and co-polymers and offers options for a variety of advanced microanalytical techniques.
The neon ion beam’s precise machining and nanofabrication abilities are the result of higher sputter yields in ion-beam milling and faster resist exposure in ion-beam lithography.
The evolution to this generation of helium-neon-gallium tool opens possibilities for multiscale nanofabrication.
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